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which was explained by the full dissociation of the SF6 and CF4 gases, leading to high concentrations of fluorine radicals in the plasma and thus

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Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

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Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar

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in the dielectric strength of SF6+CF4+Ar mixtures (a) 40%

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Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2

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The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

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The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields

Solubility of gases in liquids. 19. Solubility of He, Ne, Ar,

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The twelve binary mixtures considered here are: Ar–CH4, Ar–CF4, Ar–SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

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