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of Si and WSiN Using ECR Plasma of SF6–CF4 Gas Mixture -

The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

【PDF】Breakdown Characteristics of SF6/CF4 Mixtures in Test Chamber

SF6/CF4 Mixtures in Test Chamber and 25.8kV GIS Shin-Woo Park, Chung-Ho Hwang, Nam- Ryul, Kim, Ki-Taek Lee, and Chang-Su Huh*1 Abstract—:

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The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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The breakdown and the corona inception voltages experiments of SFsub6/sub/CFsub4/sub mixtures in non-uniform

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Solubility of Gases in Binary Liquid Mixtures: An Experimental and CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2,

Comparison of SF6 and CF4 Plasma Treatment for Surface Hydro

which was explained by the full dissociation of the SF6 and CF4 gases, leading to high concentrations of fluorine radicals in the plasma and thus

【PDF】COLD-WEATHER APPLICATION OF GAS MIXTURE (SF6/N2, SF6/CF4)

These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

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We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields

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implying that the site of action of the anaesthetic gas is in the lipidatmosphere for CF4 hydrate9 and 1.0 atmosphere for SF6 hydrate10 at 0°

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spark decomposition of SF6 and 50% SF6 + 50% CF4 mixtures

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Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

Mutation in cpsf6/CFIm68 (Cleavage and Polyadenylation

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【PDF】SF6-gas service cart SF6-CF4 separation plant

(special voltage available) Description of the plant: The SF6/CF4 gas mixture is delivered in the separation tank by a compressor in compressed and pre

Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin

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Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

The twelve binary mixtures considered here are: Ar–CH4, Ar–CF4, Ar–SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

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【PDF】Cold Weather Applications of Gas Mixture (SF6/N2, SF6/CF4)

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